Center partial measuring instrument is widely applied for optical apparatus producing and glueing and centring for optical parts,test partiality for glueing part and assemble high performance lens,test partiality of optical system.
Main parameter:
No | Name | specification |
1. | measurement head adjustable focusing objective focusing distance | 206.265mm |
2. | working distance for measurement head objective | -∞~-289mm,+441mm~+∞ |
3. | magnification rate for double micrometer eyepiece | 15 times |
4. | Measurement range for double micrometer eyepiece | X direction:0~8mm,y direction:0~8mm |
5. | Index value for digital double micrometer eyepiece | 0.001mm |
6. | workbench diameter | Φ200mm |
7. | standard configration permit measured objective weight | ≯200kg |
8. | standard configuration vertical axis swaying | ≯2" |
9. | standard configuration vertical axis jumping | ≯2μm |
10. | non straightness for column rail | ≯0.1mm |
11. | move on light route extention, reflector sway | ≯30" |
12. | sphere radius measurement range | -∞~-1mm ,+1mm~+∞ |
13. | permited measured apparatus height | ≯300mm |
14. | workbench flatness | ≯20μm |
15. | Rotational workbench can move in XY direction |
---